چکیده مقاله
Photochemical Machining is a non traditional machining process of making fine mechanical parts Lithography is the most challenging step in PCM Development of maskless lithography techniques has been providing a solution for photomask cost and complexity issues Moreover, it is a prime candidate for rapid prototyping and small scale manufacturing Laser lithography is one of the maskless techniques with a promising future through development of powerful solids state lasers A highly affordable direct laser lithography system is introduced The system employs a fast and simple focusing system capable of reaching submicron feature sizes Some early results are presented Furthermore, laser power and exposure time effects are investigated for producing micro channels with different widths
کلیدواژهها
نویسندگان
شیوه ارجاع
Jamali Ghahderijani, M and Fadaei Tehrani, A and Mirdamadi, H.R,1390,Utilizing a Maskless Laser Lithography System in Photochemical Machining,12th Iranian Conference on Manufacturing Engineering (ICME 2010),Tehran