چکیده مقاله
Sputtering is a Physical Vapor Deposition PVD vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes Due to this coating process the material performance will be improved The objective of this study is to evaluate the hardness of titanium nitride thin film layers by utilizing multi layer perceptron MLP artificial neural networks ANN For determining the influences of the various sputtering parameters voltage, work pressure, ion bombard time and Sub layer temperature on the hardness of TiN thin films, the Taguchi approach has been used 50 experiments were performed, varying the PVD parameters and the resulting hardness of the film was measured From these experiments 42 were used for the training process and 8 have been utilized for validation process A very good agreement between the ANN predictions and the experimental results was achieved, with a 99 754% correlation between the trained ANN result and the experimental measurements
کلیدواژهها
نویسندگان
A Kootsookos
School of Aerospace, Mechanical and Manufacturing Engineering, RMIT University, Melbourne, Australia
A.M Khorasani
Faculty of Hi Tech and Engineering, Iran University of Industries and Mines, Tehran, Iran
P Saadatkia
Department of Physics, Alzahra University, Tehran, Iran
شیوه ارجاع
Kootsookos, A and Khorasani, A.M and Saadatkia, P,1390,Artificial Neural Networks Modeling on TiN Coating parameters in Sputtering Process,12th Iranian Conference on Manufacturing Engineering (ICME 2010),Tehran
ارائهشده در
مجموعه مقالات دوازدهمین کنفرانس ملی مهندسی ساخت و تولید ایران6 دی 1390 · تهران